Low-Oxygen Nitride Layers Produced by UHV Ammonia Nitridation of Silicon.
| Autor: | Shriver, Mark A., Higman, T. K., Campbell, S. A., Taylor, Charles J., Roberts, Jeffrey |
|---|---|
| Zdroj: | MRS Online Proceedings Library; 2000, Vol. 611 Issue 1, p1-6, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|
Full text from SpringerLink