Inductively Coupled High-Density Plasma-Induced Etch Damage of GaN MESFETs.
| Autor: | Shul, R. J., Zhang, L., Baca, A. G., Willison, C. G., Han, J., Pearton, S. J., Lee, K. P., Ren, F. |
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| Zdroj: | MRS Online Proceedings Library; 2000, Vol. 622 Issue 1, p1-7, 7p |
| Databáze: | Complementary Index |
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