Reaction of Excess Silicon Interstitals in the Presence of Arsenic and Germanium.

Autor:	Brindos, R., Keys, P. H., Griglione, M., Jones, K. S., Law, M. E., Agarwal, Aditya, Andideh, Ebrahim
Zdroj:	MRS Online Proceedings Library; 2000, Vol. 610 Issue 1, p1-6, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink