Boron Diffusion Mechanism in Silicon Oxide Using AB Initio Methods.

Autor: Zubkov, V., Senosiain, J. P., Aronowitz, S., Sukharev, V., Musgrave, C. B.
Zdroj: MRS Online Proceedings Library; 2000, Vol. 610 Issue 1, p1-6, 6p
Databáze: Complementary Index
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