Comparison of low temperature growth of Si thin films on amorphous substrates by MBE and PECVD methods.

Autor: Selvan, J. A. Anna, Grützmacher, D., Müller, E., Rebien, M., Kummer, M., von Känel, H., Gobrecht, J.
Zdroj: MRS Online Proceedings Library; 2000, Vol. 609 Issue 1, p1-6, 6p
Databáze: Complementary Index