Accurate Dry Etching with Fluorinated Gas for Two-dimensional Si Photonic Crystal.

Autor: Takahashi, Chiharu, Takahashi, Jun-Ichi, Notomi, Masaya, Yokohama, Itaru
Zdroj: MRS Online Proceedings Library; 2000, Vol. 637 Issue 1, p1-6, 6p
Databáze: Complementary Index