Epitaxial Oxide Films on Silicon: Growth, Modeling and Device Properties.

Autor: Droopad, R., Wang, J., Eisenbeiser, K., Yu, Z., Ramdani, J., Curless, J. A., Overgaard, C. D., Finder, J. M., Hallmark, J. A., Kaushik, V., Nguyen, B. Y., Marshall, D. S., Ooms, W. J.
Zdroj: MRS Online Proceedings Library; Dec2000, Vol. 619 Issue 1, p155-165, 11p
Databáze: Complementary Index
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