Low Energy, High Density Plasma (ICP) for Low Defect Etching and Deposition Applications on Compound Semiconductors.
| Autor: | Etrillard, J., Maher, H., Medjdoub, M., Courant, J. L., Nissim, Y. I. |
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| Zdroj: | MRS Online Proceedings Library; 1999, Vol. 573 Issue 1, p189-201, 13p |
| Databáze: | Complementary Index |
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