Uniform Ultra-Thin Oxides Grown by Rapid Thermal Oxidation of Silicon in N2O Ambient.

Autor:	Xing, G. C., Lopes, D., Miner, G. E.
Zdroj:	MRS Online Proceedings Library; 1997, Vol. 470 Issue 1, p361-366, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink