Generation of positively and negatively charged molecular ions during sputtering of a copper target by low-energy Ar+ ion bombardment in a dilute argon/oxygen gas mixture.

Autor:	Hippler, Rainer, Denker, Christian
Předmět:	ION bombardment IONS REACTIVE oxygen species COPPER oxide films GAS mixtures GAS phase reactions COPPER oxide MAGNETRON sputtering
Zdroj:	Plasma Sources Science & Technology; Mar2019, Vol. 28 Issue 3, p1-8, 8p
Abstrakt:	Generation of positively and negatively charged ions during 500 eV Ar+ ion bombardment of a copper surface in a dilute argon/oxygen atmosphere was investigated by means of energy-resolved mass spectrometry. Ar+, Ar2+, Ar2+, , and ions are produced by gas phase reactions. Cun+, Cun− (n = 1−3), ArCu+, O+, and O− ions are produced by interaction with the oxygen-covered Cu surface. Interaction with reactive oxygen species gives rise to the formation of positively or negatively charged copper oxide ions. [ABSTRACT FROM AUTHOR]
Databáze:	Complementary Index
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