Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3.
| Autor: | Fares, Chaker, Ren, F., Hays, David C., Gila, B. P., Pearton, S. J. |
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| Zdroj: | ECS Journal of Solid State Science & Technology; 2019, Vol. 8 Issue 7, pQ3001-Q3006, 6p |
| Databáze: | Complementary Index |
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