| Abstrakt: |
TiO2 thin layer has been successfully deposited onto a Fluor-doped Tin Oxide (FTO) substrate using the Liquid Phase Deposition method. In this research, ammonium hexafluorotitanate and hexamethylenetetramine were used as precursors and surfactants, respectively. The effect of deposition time was then studied on optical properties, structure, and morphology of TiO2 thin film. The TiO2 layer was deposited twice at 50 ºC with various growth times of the second layer. The first layer was grown for 2 hours and the second layer was grown at 1, 2, 3, and 4 h. The optical, structural, and morphological properties of the samples were characterized using UV-Vis spectroscopy, XRD, and FESEM/EDX, respectively. The results of UV-Vis characterization showed various absorption of the peak TiO2 layer occurred in the wavelength range of 300 - 450 nm for all samples. Based on the UV-Vis absorption spectrum, the TiO2 band gap energies are in the range of 3.10 - 3.30 eV. The XRD pattern shows that the TiO2 sample has an anatase phase, with diffraction peaks for the crystalline plane (100), (004), (200) and (105) at 2theta angles: 25.50º, 37.92º, 48.04º, and 54 84º, respectively. The FESEM image shows the single layer TiO2 films grown for 2 h exhibit nanostructure having a rod-like shape. [ABSTRACT FROM AUTHOR] |
