Capability of DUV inspection for the LWR improved EUV mask of sub-15 nm hp on wafer.
| Autor: | Masato Naka, Keisuke Chiba, Ai Kumada, Keiko Morishita, Kosuke Takai, Ryoji Yoshikawa, Yukiyasu Arisawa, Takashi Kamo, Eishi Shiobara, Shingo Kanamitsu |
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| Zdroj: | Proceedings of SPIE; 7/30/2019, Vol. 11148, p111480X-1-111480X-18, 18p |
| Databáze: | Complementary Index |
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