| Autor: |
Konishi, Ryösuke, Okasaka, Yasuhiko, Imai, Hiroshi, Osaki, Tomoyuki, Harada, Hisamochi, Sasakura, Hiroshi |
| Předmět: |
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| Zdroj: |
Electronics & Communications in Japan, Part 2: Electronics; Oct87, Vol. 70 Issue 10, p87-95, 9p |
| Abstrakt: |
The dependence of amounts of absorbed hydrogen upon compositions of TixFe100-x thin film is studied. The bonding states of these hydrogenated metal films also are investigated. The films of various compositions were prepared by a sputtering method using face-to-face targets. Compositions and structures of the films were measured by XPS, x-ray diffraction and Mössbauer spectroscopy methods. After introduction of hydrogen into these films under the pressure 1 kg/cm2, the maximum amount of hydrogen was absorbed in Ti89Fe11 film. XPS measurements indicated that 2 p spectra of FE and Ti shifted to the lower energy side, and the maximum shift was observed in Ti45Fe55 film. These results suggested that stable TiFe hydride was not formed in the film which absorbed the maximum amount of hydrogen, and large amounts of absorbed hydrogen were present as solid solution in the film. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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