| Autor: |
Cho, An-Thung, Yang, Feng-yun, Liu, Zhen, Chao, Wei, Mo, Qiong-hua, Liu, Kai-jun, Ge, Bang-tong, Fu, Ting-ting, Zhou, Jeff, Hsu, James, Chen, Wade, Lu, York |
| Předmět: |
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| Zdroj: |
SID Symposium Digest of Technical Papers; Sep2019 Supplement S1, Vol. 50, p822-825, 4p |
| Abstrakt: |
Advanced four‐mask process a‐Si TFT array manufacturing method and good TFT stability is presented in this paper. We used an optimum half‐tone mask transmittance and half‐tone photoresist for the four‐mask process architecture. Data line open and photoresist peeling issues occurred in G8.6 TFT‐LCDs and solutions will be shown. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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