| Autor: |
Konishi, Ryösuke, Imai, Hiroshi, Ishibe, Shoichi, Harada, Hisamochi, Sasakura, Hiroshi |
| Předmět: |
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| Zdroj: |
Electronics & Communications in Japan, Part 2: Electronics; Jun86, Vol. 69 Issue 6, p55-62, 8p |
| Abstrakt: |
TiFe, which is well known as an oxygen occlusion alloy, was fabricated by using a composite target of TI. and Fe with sputtering. The composition and structure of liFe alloy thin-films were analyzed by using XPS, Mössbauer, x-ray diffraction and electric resistance measurements. The results show that they arc amorphous alloy thin-films consisting of 38 to 45 Ti at %. The TiFe amorphous alloy thin-film was heat-treated in ultra-high vacuum (2 × 10-9 Torr) at 450°C for one hour; then the change was investigated by measuring its depth profile with XPS. It was found that Ti precipitated and Fe decreased in the film surf ace after the heat treatment, and, at the same time, Fe increased in the lower layer; and that TiFeOx was formed internally in a part of the layer. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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