High-power, continuous-wave, scalable, single-frequency 852nm laser source for 213nm generation.

Autor: Yushi Kaneda, Tsuyoshi Tago, Toshiaki Sasa, Masahiro Sasaura, Hiroaki Nakao, Junji Hirohashi, Yasunori Furukawa
Zdroj: Proceedings of SPIE; 11/26/2018, Vol. 10902, p1-7, 7p
Databáze: Complementary Index