High-power, continuous-wave, scalable, single-frequency 852nm laser source for 213nm generation.
Autor: | Yushi Kaneda, Tsuyoshi Tago, Toshiaki Sasa, Masahiro Sasaura, Hiroaki Nakao, Junji Hirohashi, Yasunori Furukawa |
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Zdroj: | Proceedings of SPIE; 11/26/2018, Vol. 10902, p1-7, 7p |
Databáze: | Complementary Index |
Externí odkaz: |