Dislocation structure and microstrain evolution during spinodal decomposition of reactive magnetron sputtered heteroepixatial c-(Ti0.37,Al0.63)N/c-TiN films grown on MgO(001) and (111) substrates.

Autor: Calamba, K. M., Pierson, J. F., Bruyère, S., Febvrier, A. L., Eklund, P., Barrirero, J., Mücklich, F., Boyd, R., Johansson Jõesaar, M. P., Odén, M.
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Zdroj: Journal of Applied Physics; 2019, Vol. 125 Issue 10, pN.PAG-N.PAG, 11p, 5 Color Photographs, 1 Black and White Photograph, 2 Charts, 1 Graph
Abstrakt: Heteroepitaxial c-(Ti0.37,Al0.63)N thin films were grown on MgO(001) and MgO(111) substrates using reactive magnetron sputtering. High resolution high-angle annular dark-field scanning transmission electron micrographs show coherency between the film and the substrate. In the as-deposited state, x-ray diffraction reciprocal space maps show a strained epitaxial film. Corresponding geometric phase analysis (GPA) deformation maps show a high stress in the film. At elevated temperature (900 °C), the films decompose to form iso-structural coherent c-AlN- and c-TiN-rich domains, elongated along the elastically soft <100> directions. GPA analysis reveals that the c-TiN domains accommodate more dislocations than the c-AlN domains. This is because of the stronger directionality of the covalent bonds in c-AlN compared with c-TiN, making it more favorable for the dislocations to accumulate in c-TiN. The defect structure and strain generation in c-(Ti,Al)N during spinodal decomposition is affected by the chemical bonding state and elastic properties of the segregated domains. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index