Non‐Gaussian CD distribution characterization for DRAM application in EUV lithography.

Autor: Pret, Alessandro Vaglio, Lee, Inhwan, Lim, Mijung, Blankenship, David, Graves, Trey, Robertson, Stewart A., Biafore, John J.
Zdroj: Proceedings of SPIE; 8/25/2018, Vol. 10809, p108090A-1-108090A-9, 9p
Databáze: Complementary Index