Non‐Gaussian CD distribution characterization for DRAM application in EUV lithography.
Autor: | Pret, Alessandro Vaglio, Lee, Inhwan, Lim, Mijung, Blankenship, David, Graves, Trey, Robertson, Stewart A., Biafore, John J. |
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Zdroj: | Proceedings of SPIE; 8/25/2018, Vol. 10809, p108090A-1-108090A-9, 9p |
Databáze: | Complementary Index |
Externí odkaz: |