| Autor: |
Adel, Mike, Ghinovker, Mark, Golovanevsky, Boris, Izikson, Pavel, Kassel, Elyakim, Yaffe, Dan, Bruckstein, Alfred M., Goldenberg, Roman, Rubner, Yossi, Rudzsky, Michael |
| Předmět: |
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| Zdroj: |
IEEE Transactions on Semiconductor Manufacturing; May2004, Vol. 17 Issue 2, p166-179, 14p |
| Abstrakt: |
In this paper, we provide a detailed analysis of overlay metrology mark and find the mapping between various properties of mark patterns and the expected dynamic precision and fidelity of measurements. We formulate the optimality criteria and suggest and optimal overlay mark design in the sense of minimizing the Cramer-Rao lower bound on the estimating error. Based on the developed theoretical results, a new overlay mark family is proposed-the grating marks. A thorough testing performed on the theory and demonstrate the superior quality of the new design over the overlay patterns used today. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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