Application of deep learning algorithms for Lithographic mask characterization.
| Autor: | Woldeamanual, Dereje S., Erdmann, Andreas, Maier, Andreas |
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| Zdroj: | Proceedings of SPIE; 5/2/2018, Vol. 10694, p1069408-1-1069408-12, 12p |
| Databáze: | Complementary Index |
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