Co-optimization of Exposure Dose and Etch process for SAQP Pitch walk control.
| Autor: | Maslow, Mark John, Timoshkov, Vadim, Kiers, Ton, Tae Kwon Jee, Reijnen, Liesbeth, Kumar, Kaushik, Demand, Marc, Fonseca, Carlos, Cerbu, Florin, Schelcher, Guillaume, Beral, Christophe |
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| Zdroj: | Proceedings of SPIE; 1/15/2018, Vol. 10587, p1-14, 14p |
| Databáze: | Complementary Index |
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