Smart overlay metrology pairing adaptive deep learning with the physics-based models used by a lithographic apparatus.
| Autor: | Chan Hwang, Seung Yoon Lee, SeungHwa Oh, Schmitt-Weaver, Emil, Jeonghyun Park, Park, Daniel, El Kodadi, Mohamed, Bhattacharyya, Kaustuve |
|---|---|
| Zdroj: | Proceedings of SPIE; 1/15/2018, Vol. 10587, p1-7, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|