EUV resist sensitization and roughness improvement by PSCARTM with in-line UV flood exposure system.
| Autor: | Seiji Nagahara, Carcasi, Michael, Gosuke Shiraishi, Yuya Kamei, Nafus, Kathleen, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Takahiro Shiozawa, Keisuke Yoshida, Masashi Enomoto, Kosuke Yoshihara, Hideo Nakashima, Serge Biesemans, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Teruhiko Moriya, Makoto Hayakawa, Ryo Aizawa |
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| Zdroj: | Proceedings of SPIE; 1/14/2018, Vol. 10586, p1-11, 11p |
| Databáze: | Complementary Index |
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