Extreme Ultraviolet Mask Multilayer Material Variation Impact on Horizontal to Vertical Pattern Bias.
| Autor: | Melvin III, Lawrence S., Kandel, Yudhishthir, Yan, Qiliang, Isoyan, Artak, Weimin Gao |
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| Zdroj: | Proceedings of SPIE; 1/11/2018, Vol. 10583, p1-10, 10p |
| Databáze: | Complementary Index |
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