Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology.
| Autor: | Sharma, Akhil, Verheijen, Marcel A., Wu, Longfei, Karwal, Saurabh, Vandalon, Vincent, Knoops, Harm C. M., Sundaram, Ravi S., Hofmann, Jan P., Kessels, W. M. M. (Erwin), Bol, Ageeth A. |
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| Zdroj: | Nanoscale; 5/14/2018, Vol. 10 Issue 18, p8615-8627, 13p |
| Databáze: | Complementary Index |
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