Low Frequency Noise Analysis of Impact of Metal Gate Processing on the Gate Oxide Stack Quality.
| Autor: | Claeys, C., He, L., O'Sullivan, B. J., Veloso, A., Horiguchi, N., Collaert, N., Simoen, E. |
|---|---|
| Zdroj: | ECS Journal of Solid State Science & Technology; 2018, Vol. 7 Issue 3, pQ26-Q32, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|