Massive metrology using fast e-beam technology improves OPC model accuracy by >2x at faster turnaround time.
| Autor: | Qian Zhao, Wang, Lei, Wang, Jazer, ChangAn Wang, Hong-Fei Shi, Guerrero, James, Mu Feng, Qiang Zhang, Jiao Liang, Yunbo Guo, Chen Zhang, Wallow, Tom, Rio, David, Wang, Lester, Wang, Alvin, Jen-Shiang Wang, Gronlund, Keith, Jun Lang, Kar Kit Koh, Dong Qing Zhang |
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| Zdroj: | Proceedings of SPIE; 2018, Vol. 10585, p1-9, 9p |
| Databáze: | Complementary Index |
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