Approaches of multilayer overlay process control for 28nm FD-SOI derivative applications.

Autor: Duclaux, Benjamin, De Caunes, Jean, Perrier, Robin, Gatefait, Maxime, Le Gratiet, Bertrand, Chapon, Jean-Damien, Monget, Cédric
Zdroj: Proceedings of SPIE; 2018, Vol. 10585, p1-13, 13p
Databáze: Complementary Index