COMPUTER SIMULATION OF GAS-PHASE PLASMA CHEMISTRY AND SILICON ION CLUSTER FORMATION DURING PECVD.

Autor:	STEKOLNIKOV, A. F., FESHCHENKO, D. V., METELSKIY, T. A., BELICH, R. F.
Předmět:	PLASMA chemistry SILICON analysis IONS QUANTUM computing PLASMA-enhanced chemical vapor deposition
Zdroj:	Physics, Chemistry & Application of Nanostructures - Reviews & Short Notes To Nanomeeting-2001; 2001, p424-427, 4p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu