PASSIVATION OF SHALLOW DOPANTS IN II-VI SEMICONDUCTORS.

Autor: WOLF, H., FILZ, T., HAMANN, J., JOST, A., OSTHEIMER, V., WICHERT, TH.
Předmět:
Zdroj: Shallow-Level Centers in Semiconductors - Proceedings of the 7th International Conference; 1997, p123-134, 12p
Databáze: Complementary Index