POSITRON ANNIHILATION STUDIES OF NITRIDE FILMS MODIFIED BY ION BOMBARDEMENT: IN SEARCH FOR A CAUSE OF STRESS-RELAXATION.

Autor:	NOWAK, R., FÄLT, T., HEISKANEN, K., FRĄCKOWIAK, J. E., MORAWIEC, H., LI, C. L., HIRVONEN, A., SEKINO, T., NIIHARA, K.
Předmět:	NITRIDES THIN film crystallography THIN films spectra POSITRON annihilation SPUTTERING (Physics) ION bombardment measurement ION beams STRAINS & stresses (Mechanics)
Zdroj:	Applied Crystallography, Proceedings of the Xix Conference; 2004, p355-359, 5p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu