Electrical properties of thin films deposited from TMS/O2 in Microwave Multipolar Plasma reactor.
| Autor: | M Kihel, S Sahli, Y Fermi, P Raynaud, M Benhaddad |
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| Zdroj: | Journal of Physics: Conference Series; 2018, Vol. 987 Issue 1, p1-1, 1p |
| Databáze: | Complementary Index |
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