Effect of N2O/BCl3 Cyclical Recess Etching Technique Used Prior to Anode Metal Deposition in AlGaN/GaN Schottky Barrier Diodes.
| Autor: | Hsueh, Kuang-Po, Wang, Hsiang-Chun, Chen, Shang-Cyun, Chiu, Jiun-Wei, Li, Bo-Hong, Chien, Feng-Tso, Chiu, Hsien-Chin |
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| Zdroj: | ECS Journal of Solid State Science & Technology; 2017, Vol. 6 Issue 10, pN177-N181, 5p |
| Databáze: | Complementary Index |
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