Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity, and molecular design method.
| Autor: | Takashi Sato, Tomoaki Takigawa, Yuta Togashi, Takumi Toida, Masatoshi Echigo, Tetsuo Harada, Takeo Watanabe, Hiroto Kudo |
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| Zdroj: | Proceedings of SPIE; 8/14/2017, Vol. 10450, p1-8, 8p |
| Databáze: | Complementary Index |
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