Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography.
| Autor: | van Setten, Eelco, Bottiglieri, Gerardo, de Winter, Laurens, McNamara, John, Rusu, Paul, Lubkoll, Jan, Rispens, Gijsbert, van Schoot, Jan, Neumann, Jens Timo, Roesch, Matthias, Kneer, Bernhard |
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| Zdroj: | Proceedings of SPIE; 8/14/2017, Vol. 10450, p1-12, 12p |
| Databáze: | Complementary Index |
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