Chemical Mechanical Polishing of Chemical Vapor Deposited Co Films with Minimal Corrosion in the Cu/Co/Mn/SiCOH Patterned Structures.

Autor:	Sagi, K. V., Teugels, L. G., van der Veen, M. H., Struyf, Herbert, Alety, S. R., Babu, S. V.
Zdroj:	ECS Journal of Solid State Science & Technology; 2017, Vol. 6 Issue 5, p276-283, 8p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu