Proximity-compensated kinoforms directly written by e-beam lithography.
Autor: | Larsson, M., Ekberg, M., Nikolajeff, F., Hård, S., Maker, P. M., Muller, R. E. |
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Zdroj: | Proceedings of SPIE; 2/16/2017, Vol. 10271, p138-161, 24p |
Databáze: | Complementary Index |
Externí odkaz: |