Proximity-compensated kinoforms directly written by e-beam lithography.

Autor: Larsson, M., Ekberg, M., Nikolajeff, F., Hård, S., Maker, P. M., Muller, R. E.
Zdroj: Proceedings of SPIE; 2/16/2017, Vol. 10271, p138-161, 24p
Databáze: Complementary Index