| Autor: |
Capps, Nathan E., Mackie, Neil M. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 11/1/1998, Vol. 84 Issue 9, p4736, 8p |
| Abstrakt: |
Focuses on the measurement of the surface reactivities for CHF3 plasma molecular beam during the film deposition on a variety of substrates. Reference to the use of imaging of radicals interacting with surfaces (IRIS) technique; Characterization of film deposited during IRIS experiments; Potential of the imaging of radicals interacting with surface (IRIS) technique. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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