Study on atomic layer etching of Si in inductively coupled Ar/Cl2 plasmas driven by tailored bias waveforms.
| Autor: | Xiaoqin MA, Saiqian ZHANG, Zhongling DAI, Younian WANG |
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| Zdroj: | Plasma Science & Technology; 8/1/2017, Vol. 19 Issue 8, p1-1, 1p |
| Databáze: | Complementary Index |
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