Magnetic and microstructural properties of sputter deposited Cr-doped aluminum nitride thin films on silicon substrates.

Autor: Wistrela, E., Bittner, A., Schneider, M., Reissner, M., Schmid, U.
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Zdroj: Journal of Applied Physics; 2017, Vol. 121 Issue 11, p1-7, 7p, 1 Diagram, 1 Chart, 6 Graphs
Abstrakt: In this paper, we report on the microstructural and magnetic properties of CrxAl1-xN thin films with Cr concentrations ranging up to x=(8.5 ± 0.5) at. %. The thin films are sputter deposited on silicon substrates and exhibit a wurtzite type microstructure verified by X-ray diffraction measurements. A vibrating sample magnetometer based measurement equipment is used to investigate magnetic properties of the Cr doped thin films in a temperature range of T=10 K-300 K, revealing a paramagnetic behavior. With increasing temperature, the temperature independent diamagnetic contribution of the substrate material dominates the overall response characteristics. No room temperature ferromagnetism is observed for all samples investigated. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index