| Autor: |
Zoric, Nenad, Livshits, Irina, Dilworth, Don, Okishev, Sergey |
| Předmět: |
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| Zdroj: |
Advanced Optical Technologies; Feb2017, Vol. 6 Issue 1, p31-38, 8p |
| Abstrakt: |
This paper describes a method for designing an ultraviolet (UV) projection lens for microlithography. Our approach for meeting this objective is to use a starting design automatically obtained by the DSEARCH feature in the SYNOPSYS? lens design program. We describe the steps for getting a desired starting point for the projection lens and discuss optimization problems unique to this system, where the two parts of the projection lens are designed independently. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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