| Autor: |
Jinghua Han, Qiuhui Zhang, Weixing Fan, Guoying Feng, Yaguo Li, Aixiang Wei, Ruifeng Hu, Qiongqiong Gu |
| Předmět: |
|
| Zdroj: |
Journal of Applied Physics; 2017, Vol. 121 Issue 6, p1-9, 9p, 3 Diagrams, 1 Chart, 10 Graphs |
| Abstrakt: |
The characteristics of Ta2O5 films deposited by radio frequency pure oxygen ion assisted deposition (RFOIAD) technology were compared to a gas mixture of oxygen and argon (O2/Ar) ion beam assisted deposition experimentally and theoretically, inclusive of optical, electronic, and laser-induced damage resistance. The results showed that the RFOIAD could make removal of the pinholes and oxygen vacancies in the film and increase of the band gap, which resulted in the enhancement of refractive index, breakdown voltage, and the diminution of absorptivity as well as leakage current. The laser induced damage testing suggested that the damage induced damage threshold of the film deposited by RFOIAD could be increased, but the cracks appeared easily due to the concentration of thermal stress. While for the Ta2O5 film deposited using a sputtering gas of the mixtures of oxygen and argon, the porous characteristics were helpful to relief the thermal stress concentration, and the formation of cracks can be avoided. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
|
