Farewell to Stan Vepřek, Founding Editor of Plasma Chemistry and Plasma Processing.
| Autor: | Murphy, Anthony |
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| Zdroj: | Plasma Chemistry & Plasma Processing; Jan2017, Vol. 37 Issue 1, p1-4, 4p |
| Abstrakt: | The author profiles Stan Vepřek, founding editor of the journal “Plasma Chemistry and Plasma Processing,” discusses his contribution to the journal “Plasma Chemistry and Plasma Processing,” and mentions the journal’s new joint Editor-in- Chief, Professor Bruce Locke of Florida State University. |
| Databáze: | Complementary Index |
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