Mixed aluminum precursor in the atomic layer deposited Al2O3 for effective silicon emitter passivation.
| Autor: | Bao, Yameng, Huang, Haibing, Lv, Jun, Savin, Hele |
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| Zdroj: | 2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC); 2016, p2859-2862, 4p |
| Databáze: | Complementary Index |
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