Metal wiring critical dimension shrink using ALD spacer in BEOL sub-50nm pitch.
| Autor: | Shah, Ketan, Periasamy, Prakash, Chandrasekhar, Ashwini, Mahalingam, Anbu Selvam K M, Pal, Shyam, Ordonio, Christopher, Welti, Peter, Low, Chun Hui, Child, Craig |
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| Zdroj: | 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2016, p316-319, 4p |
| Databáze: | Complementary Index |
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