Bevel rinse optimization for reduced edge defectivity and improved edge yield.
| Autor: | Silvestre, Mary Claire, Ramanathan, Eswar, Hildreth, Scott, Duggan, Mark, Riendeau, Jeffrey, Dumas, Laurent |
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| Zdroj: | 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2016, p124-128, 5p |
| Databáze: | Complementary Index |
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