Inline monitoring of SiGe strain relaxed buffers (SRBs) using high-resolution X-ray diffraction: AM: Advanced metrology.
Autor: | Mendoza, B., L'Herron, B., Loubet, N., Fronheiser, J., Reznicek, A., Gaudiello, J., Gin, P., Matney, K. M., Wall, J., Ryan, P., Wormington, M. |
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Zdroj: | 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2016, p44-49, 6p |
Databáze: | Complementary Index |
Externí odkaz: |