Effect of post CMP in-situ cleaning and its optimization on the defect improvement: CFM: Contamination free manufacturing.
| Autor: | Kim, Hong Jin, Lee, Tae Hoon, Govindarajulu, Venugopal, Mazzotti, Jason |
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| Zdroj: | 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2016, p1-5, 5p |
| Databáze: | Complementary Index |
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