Characterization of Advanced Sequential Flow Deposition (ASFD) TiON electrode in MIM structure for leakage current reduction.
| Autor: | Ishizaka, Tadahiro, Koizumi, Masaki, Sano, Masaki, Seokhyoung Hong, Koizumi, Masato, Cheonsoo Han, Akiyama, Koji, Aoki, Sara, Shiraga, Kentaro, Tanimura, Tatsuhiko |
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| Zdroj: | 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC); 2016, p180-182, 3p |
| Databáze: | Complementary Index |
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